PHYSICAL ASPECTS OF VACUUM-ARC COATING DEPOSITION

PHYSICAL ASPECTS OF VACUUM-ARC COATING DEPOSITION

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The brief analytical review of literary data concerning the processes which are a physical basis of vacuum-arc coating deposition technology is presented.The phenomena responsible for formation of films by condensation of substance cent dyyni from plasma of arc discharge in vacuum or in a gaseous ambience of low pressure are described.Interaction of metal plasma with a gas target, a substrate and other surfaces of working chamber, the processes of nucleation and condensate growth, influence of energetic parameters of a deposition process (kinetic and potential energy of metal ions, activation degree ds durga hand soap and sort of the gas ) on properties of condensates and near-surface layers of the substrate are described.